Author:Muller, TFG; Knoesen, D; Arendse, C; Swanepoel, R; Halindintwali, S; Theron, CDate:2006Hot-wire chemical vapour deposition (HWCVD) has been used to prepare both hydrogenated amorphous silicon (a-Si:H) and nano/ microcrystalline thin layers as intrinsic material at different deposition conditions, in order to establish optimum ...Read more