This paper reports on the thermally induced changes of the nano-structural and optical properties of hydrogenated nanocrystalline silicon in the temperature range 200–700 °C. The as-deposited sample has a high crystalline volume fraction of 53% with an average crystallite size of ~3.9 nm, where 66% of the total hydrogen is bonded as :Si–H monohydrides on the nano-crystallite surface. A growth in the native crystallite size and crystalline volume fraction occurs at annealing temperatures =400 °C, where hydrogen is initially removed from the crystallite grain boundaries followed by its removal from the amorphous network. The nucleation of smaller nano-crystallites at higher temperatures accounts for the enhanced porous structure and the increase in the optical band gap and average gap.
Reference:
Arendse, CJ, Malgas, GF, Muller, TFG et al. 2009. Thermally induced nano-structural and optical changes of nc-Si:H deposited by hot-wire CVD. Nanoscale Research Letters, Vol. 4(4), pp 307-312
Arendse, C., Malgas, G., Muller, T., Knoesen, D., Oliphant, C., Motaung, D., & Mwakikunga, B. W. (2009). Thermally induced nano-structural and optical changes of nc-Si:H deposited by hot-wire CVD. http://hdl.handle.net/10204/3732
Arendse, CJ, GF Malgas, TFG Muller, D Knoesen, CJ Oliphant, DE Motaung, and Bonex W Mwakikunga "Thermally induced nano-structural and optical changes of nc-Si:H deposited by hot-wire CVD." (2009) http://hdl.handle.net/10204/3732
Arendse C, Malgas G, Muller T, Knoesen D, Oliphant C, Motaung D, et al. Thermally induced nano-structural and optical changes of nc-Si:H deposited by hot-wire CVD. 2009; http://hdl.handle.net/10204/3732.
Copyright: 2009 Springer-Verlag. This is the author's version of the work. It is posted here by permission of Springer-Verlag for your personal use. Not for redistribution. The definitive version was published in the Nanoscale Research Letters, Vol. 4(4), pp 307-312
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